Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9859119 | Self-organization material and pattern formation method | Akira Watanabe, Naoko Kihara, Ryosuke Yamamoto | 2018-01-02 |
| 9064522 | Stamper and method of manufacturing bit patterned medium using stamper | Masahiro Kanamaru, Yoshiyuki Kamata, Ryosuke Yamamoto, Akira Kikitsu, Katsuya Sugawara +2 more | 2015-06-23 |
| 8956560 | Method of manufacturing mold | Yasuaki Ootera, Yoshiyuki Kamata, Naoko Kihara, Yoshiaki Kawamonzen, Ryosuke Yamamoto +5 more | 2015-02-17 |
| 8916053 | Pattern forming method | Yoshiaki Kawamonzen, Yasuaki Ootera, Akiko Yuzawa, Naoko Kihara, Yoshiyuki Kamata +5 more | 2014-12-23 |
| 8896951 | Magnetic disk and magnetic recording/reproducing apparatus | Naoko Kihara, Yoshiyuki Kamata | 2014-11-25 |
| 8840258 | Antireflection structure formation method and antireflection structure | Tsutomu Nakanishi, Akira Fujimoto, Koji Asakawa, Shinobu Sugimura | 2014-09-23 |
| 8654475 | Stampers and magnetic disks | — | 2014-02-18 |
| 8361339 | Antireflection structure formation method and antireflection structure | Tsutomu Nakanishi, Akira Fujimoto, Koji Asakawa, Shinobu Sugimura | 2013-01-29 |
| 8097351 | Magnetic recording apparatus | Seiji Morita, Yoshiyuki Kamata, Satoshi Shirotori, Masatoshi Sakurai, Hiroaki Nakamura | 2012-01-17 |
| 7817377 | Original disk fabrication method, magnetic recording medium manufacturing method and magnetic recording medium | — | 2010-10-19 |
| 7738213 | Magnetic disk medium, reticle and magnetic recording and reproducing apparatus | Seiji Morita, Masatoshi Sakurai, Shinobu Sugimura | 2010-06-15 |
| 7623311 | Recording media, recording and reproducing apparatus, and method for recording and reproducing | Masatoshi Sakurai | 2009-11-24 |
| 7388725 | Magnetic recording media, method of manufacturing the same and magnetic recording apparatus | Masatoshi Sakurai, Makoto Asakura | 2008-06-17 |
| 7319568 | Magnetic recording media, magnetic recording apparatus, and stamper | Akira Kikitsu, Yoichiro Tanaka, Yoshiyuki Kamata | 2008-01-15 |
| 7163781 | Process for producing a semiconductor device | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito | 2007-01-16 |
| 7119156 | Resist resin | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito | 2006-10-10 |
| 7070905 | Pattern forming process | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito | 2006-07-04 |
| 7063932 | Resist resin | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito | 2006-06-20 |
| 7029823 | Resist composition | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito | 2006-04-18 |
| 6824957 | Resin useful for resist, resist composition and pattern forming process using the same | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito | 2004-11-30 |
| 6660450 | Resin useful for resist, resist composition and pattern forming process using the same | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito | 2003-12-09 |
| 6541597 | Resin useful for resist, resist composition and pattern forming process using the same | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito | 2003-04-01 |
| 6440636 | Polymeric compound and resin composition for photoresist | Toru Ushirogouchi, Koji Asakawa, Naomi Shida, Yoshinori Funaki, Kiyoharu Tsutsumi +2 more | 2002-08-27 |
| 6410748 | Alicycli c group-containing monomer | Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Shuji Hayase, Yoshihiko Nakano +1 more | 2002-06-25 |
| 6303266 | Resin useful for resist, resist composition and pattern forming process using the same | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito | 2001-10-16 |