YS

Yuichiro Shindo

JM Jx Nippon Mining & Metals: 31 patents #1 of 262Top 1%
JE Japan Energy: 9 patents #2 of 240Top 1%
NC Nippon Mining & Metals Co.: 7 patents #10 of 166Top 7%
NC Nikko-Materials Co.: 3 patents #10 of 74Top 15%
📍 Ibaraki, JP: #74 of 6,779 inventorsTop 2%
Overall (All Time): #54,678 of 4,157,543Top 2%
50
Patents All Time

Issued Patents All Time

Showing 26–50 of 50 patents

Patent #TitleCo-InventorsDate
8003065 Method for collection of valuable metal from ITO scrap Kouichi Takemoto 2011-08-23
7964070 Highly pure hafnium material, target thin film comprising the same and method for producing highly pure hafnium 2011-06-21
7959782 Method of manufacturing a Ni-Pt alloy 2011-06-14
7938918 High-purity Ni-V alloy, target therefrom, high-purity Ni-V alloy thin film and process for producing high-purity Ni-V alloy Yasuhiro Yamakoshi 2011-05-10
7887603 High purity copper sulfate and method for production thereof Kouichi Takemoto 2011-02-15
7871564 High-purity Ru alloy target, process for producing the same, and sputtered film Gaku Kanou 2011-01-18
7695527 High purity copper sulfate and method for production thereof Kouichi Takemoto 2010-04-13
7674441 Highly pure hafnium material, target and thin film comprising the same and method for producing highly pure hafnium 2010-03-09
7578965 High-purity Ru powder, sputtering target obtained by sintering the same, thin film obtained by sputtering the target and process for producing high-purity Ru powder Akira Hisano 2009-08-25
7510635 High purity zinc oxide powder and method for production thereof, and high purity zinc oxide target and thin film of high purity zinc oxide Kouichi Takemoto 2009-03-31
7484546 Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target Masataka Yahagi, Hideo Takami 2009-02-03
7435325 Method for producing high purity nickle, high purity nickle, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target Kouichi Takemoto 2008-10-14
7156964 Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target Masataka Yahagi, Hideo Takami 2007-01-02
6896788 Method of producing a higher-purity metal Syunichiro Yamaguchi, Kouichi Takemoto 2005-05-24
6861030 Method of manufacturing high purity zirconium and hafnium 2005-03-01
6755948 Titanium target for sputtering Hideaki Fukuyo, Hideyuki Takahashi 2004-06-29
6485542 Ni-Fe alloy sputtering target for forming magnetic thin films, magnetic thin film, and method of manufacturing the Ni-Fe alloy sputtering target Tsuneo Suzuki 2002-11-26
6458182 Process for producing high-purity Mn materials Tsuneo Suzuki 2002-10-01
6284013 Method for preparing high-purity ruthenium sputtering target and high-purity ruthenium sputtering target Tsuneo Suzuki 2001-09-04
6270593 Mn alloy materials for magnetic materials, Mn alloy sputtering targets, and magnetic thin films Tsuneo Suzuki 2001-08-07
6267827 Ni-Fe alloy sputtering target for forming magnetic thin films, magnetic thin film, and method of manufacturing the Ni-Fe alloy sputtering target Tsuneo Suzuki 2001-07-31
6245203 BaxSr1-xTiO3-y target materials for sputtering Ryo Suzuki, Tsuneo Suzuki 2001-06-12
6036741 Process for producing high-purity ruthenium Tsuneo Suzuki 2000-03-14
5810983 High purity cobalt sputtering targets Tsuneo Suzuki 1998-09-22
5667665 Process of producing high purity cobalt Tsuneo Suzuki 1997-09-16