Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11651790 | Thin film comprising titanium oxide, and method of producing thin film comprising titanium oxide | Hideo Takami | 2023-05-16 |
| 9663405 | Oxide sintered compact, its production method, and raw material powder for producing oxide sintered compact | Masakatsu Ikisawa, Kozo Osada, Takashi Kakeno, Hideo Takami | 2017-05-30 |
| 9028726 | Oxide sintered compact for producing transparent conductive film | Masakatsu Ikisawa | 2015-05-12 |
| 8882975 | Sb-Te base alloy sinter sputtering target | Hideyuki Takahashi, Hirohisa Ajima | 2014-11-11 |
| 8877021 | Chromic oxide powder for sputtering target, and sputtering target manufactured from such chromic oxide powder | Hideo Takami | 2014-11-04 |
| 8758497 | Sputtering target of sintered Ti—Nb based oxide, thin film of Ti—Nb based oxide, and method of producing the thin film | Hideo Takami | 2014-06-24 |
| 8728358 | Sintered compact, amorphous film and crystalline film of composite oxide, and process for producing the films | Masakatsu Ikisawa, Kozo Osada, Takashi Kakeno | 2014-05-20 |
| 8663439 | Sputtering target for producing metallic glass membrane and manufacturing method thereof | Atsushi Nakamura, Akihisa Inoue, Hisamichi Kimura, Shin-ichi Yamaura | 2014-03-04 |
| 8652399 | Sputtering target for producing metallic glass membrane and manufacturing method thereof | Atsushi Nakamura, Akihisa Inoue, Hisamichi Kimura, Shin-ichi Yamaura | 2014-02-18 |
| 8501052 | Thin film comprising titanium oxide as main component and sintered compact sputtering target comprising titanium oxide as main component | Hideo Takami | 2013-08-06 |
| 8430978 | Sputtering target and method for production thereof | Akihisa Inoue, Hisamichi Kimura, Kenichiro Sasamori, Atsushi Nakamura, Hideyuki Takahashi | 2013-04-30 |
| 8277694 | Sintered compact of composite oxide, amorphous film of composite oxide, process for producing said film, crystalline film of composite oxide and process for producing said film | Masakatsu Ikisawa, Kozo Osada, Takashi Kakeno | 2012-10-02 |
| 8252206 | Amorphous film of composite oxide, crystalline film of composite oxide, method of producing said films and sintered compact of composite oxide | Masakatsu Ikisawa, Kozo Osada, Takashi Kakeno | 2012-08-28 |
| 8148245 | Method for producing a-IGZO oxide thin film | Masakatsu Ikisawa | 2012-04-03 |
| 8007693 | Zinc oxide based transparent electric conductor, sputtering target for forming of the conductor and process for producing the target | Masakatsu Ikisawa | 2011-08-30 |
| 7897068 | Sputtering target, thin film for optical information recording medium and process for producing the same | Hideo Hosono, Kazushige Ueda, Hideo Takami | 2011-03-01 |
| 7892457 | Sputtering target, thin film for optical information recording medium and process for producing the same | Hideo Hosono, Kazushige Ueda, Hideo Takami | 2011-02-22 |
| 7789948 | Hydrogen separation membrane, sputtering target for forming said hydrogen separation membrane, and manufacturing method thereof | Atsushi Nakamura, Akihisa Inoue, Hisamichi Kimura, Shin-ichi Yamaura | 2010-09-07 |
| 7727639 | Iron-based sintered compact and method for production thereof | Toru Imori, Atsushi Nakamura | 2010-06-01 |
| 7718095 | Sputtering target, thin film for optical information recording medium and process for producing the same | Hideo Hosono, Kazushige Ueda, Hideo Takami | 2010-05-18 |
| 7699965 | Zinc oxide-based transparent conductor and sputtering target for forming the transparent conductor | Masakatsu Ikisawa | 2010-04-20 |
| 7691172 | Metallic powder for powder metallurgy whose main component is iron and iron-based sintered body | Toru Imori, Atsushi Nakamura, Yasushi Narusawa | 2010-04-06 |
| 7666245 | Metallic powder for powder metallurgy whose main component is iron and iron-based sintered body | Toru Imori, Atsushi Nakamura, Yasushi Narusawa | 2010-02-23 |
| 7635440 | Sputtering target, thin film for optical information recording medium and process for producing the same | Hideo Hosono, Kazushige Ueda, Hideo Takami | 2009-12-22 |
| 7484546 | Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target | Yuichiro Shindo, Hideo Takami | 2009-02-03 |