Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12198911 | Nonmagnetic material-dispersed Fe-Pt based sputtering target | Atsushi Sato, Yuichiro Nakamura | 2025-01-14 |
| 11651790 | Thin film comprising titanium oxide, and method of producing thin film comprising titanium oxide | Masataka Yahagi | 2023-05-16 |
| 10037830 | Indium oxide transparent conductive film | Masakatsu Ikisawa | 2018-07-31 |
| 9773653 | Ferromagnetic material sputtering target containing chromium oxide | Atsutoshi Arakawa | 2017-09-26 |
| 9761422 | Magnetic material sputtering target and manufacturing method for same | Atsutoshi Arakawa, Yuichiro Nakamura | 2017-09-12 |
| 9732414 | Co—Cr—Pt-based sputtering target and method for producing same | Atsushi Sato, Yuki Ikeda, Atsutoshi Arakawa, Yuichiro Nakamura | 2017-08-15 |
| 9663405 | Oxide sintered compact, its production method, and raw material powder for producing oxide sintered compact | Masakatsu Ikisawa, Masataka Yahagi, Kozo Osada, Takashi Kakeno | 2017-05-30 |
| 9605339 | Sputtering target for magnetic recording film and process for production thereof | Shin-ichi Ogino, Atsushi Nara | 2017-03-28 |
| 9589695 | Indium oxide transparent conductive film | Masakatsu Ikisawa | 2017-03-07 |
| 9567665 | Sputtering target for magnetic recording film, and process for producing same | Atsushi Nara, Shin-ichi Ogino | 2017-02-14 |
| 9273389 | Cu—In—Ga—Se quaternary alloy sputtering target | Tomoya Tamura, Masaru Sakamoto | 2016-03-01 |
| 9214253 | Sintered compact of indium oxide system, and transparent conductive film of indium oxide system | Masakatsu Ikisawa | 2015-12-15 |
| 8877021 | Chromic oxide powder for sputtering target, and sputtering target manufactured from such chromic oxide powder | Masataka Yahagi | 2014-11-04 |
| 8771557 | Indium oxide sintered compact, indium oxide transparent conductive film, and manufacturing method of indium oxide transparent conductive film | Masakatsu Ikisawa | 2014-07-08 |
| 8758497 | Sputtering target of sintered Ti—Nb based oxide, thin film of Ti—Nb based oxide, and method of producing the thin film | Masataka Yahagi | 2014-06-24 |
| 8501052 | Thin film comprising titanium oxide as main component and sintered compact sputtering target comprising titanium oxide as main component | Masataka Yahagi | 2013-08-06 |
| 7897068 | Sputtering target, thin film for optical information recording medium and process for producing the same | Hideo Hosono, Kazushige Ueda, Masataka Yahagi | 2011-03-01 |
| 7892457 | Sputtering target, thin film for optical information recording medium and process for producing the same | Hideo Hosono, Kazushige Ueda, Masataka Yahagi | 2011-02-22 |
| 7718095 | Sputtering target, thin film for optical information recording medium and process for producing the same | Hideo Hosono, Kazushige Ueda, Masataka Yahagi | 2010-05-18 |
| 7635440 | Sputtering target, thin film for optical information recording medium and process for producing the same | Hideo Hosono, Kazushige Ueda, Masataka Yahagi | 2009-12-22 |
| 7484546 | Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target | Masataka Yahagi, Yuichiro Shindo | 2009-02-03 |
| 7344660 | Sputtering target and process for producing the same | Hideo Hosono, Kazushige Ueda, Masataka Yahagi | 2008-03-18 |
| 7279211 | Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using the target, and method for manufacturing the sputtering target | Masataka Yahagi | 2007-10-09 |
| 7156964 | Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target | Masataka Yahagi, Yuichiro Shindo | 2007-01-02 |
| 6528442 | Optical transparent film and sputtering target for forming optical transparent film | Katsuo Kuwano | 2003-03-04 |