Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12287569 | Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography | Hisako ISHIKAWA, Ryohei Ogawa, Atsushi Okubo, Kazuo Kohmura, Atsuko Sekiguchi +3 more | 2025-04-29 |
| 12078923 | Pellicle, exposure original plate, exposure apparatus, method of manufacturing pellicle, and method of manufacturing semiconductor device | — | 2024-09-03 |