Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8110486 | Method of manufacturing semiconductor wafer by forming a strain relaxation SiGe layer on an insulating layer of SOI wafer | Koji Matsumoto, Akihiko Endo, Etsurou Morita, Masaharu Ninomiya | 2012-02-07 |