Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9796063 | Multi-layered chemical-mechanical planarization pad | Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, Oscar K. Hsu, David Adam Wells +2 more | 2017-10-24 |
| 9162341 | Chemical-mechanical planarization pad including patterned structural domains | Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, David Adam Wells, Oscar K. Hsu | 2015-10-20 |
| 8790165 | Multi-layered chemical-mechanical planarization pad | Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, Oscar K. Hsu, David Adam Wells +2 more | 2014-07-29 |
| 8684794 | Chemical mechanical planarization pad with void network | Paul Andre Lefevre, Oscar K. Hsu, David Adam Wells, Anoop Mathew, Guangwei Wu | 2014-04-01 |
| 8435099 | Chemical-mechanical planarization pad including patterned structural domains | Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, David Adam Wells, Oscar K. Hsu | 2013-05-07 |
| 8377351 | Polishing pad with controlled void formation | Paul Andre Lefevre, David Adam Wells, Marc C. Jin, Oscar K. Hsu, John Erik Aldeborgh +2 more | 2013-02-19 |