Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5276126 | Selected novolak resin planarization layer for lithographic applications | — | 1994-01-04 |
| 5164286 | Photoresist developer containing fluorinated amphoteric surfactant | Andrew J. Blakeney, Medhat A. Toukhy, David Brzozowy | 1992-11-17 |
| 5069996 | Process for developing selected positive photoresists | — | 1991-12-03 |