Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8975170 | Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions | Ligui Zhou, Roger Leung, Wenya Fan, Helen Xu, Lea M. Metin +1 more | 2015-03-10 |
| 8901268 | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof | Ahila Krishnamoorthy, Amanuel Gebrebrhan | 2014-12-02 |
| 8629294 | Borate esters, boron-comprising dopants, and methods of fabricating boron-comprising dopants | Edward W. Rutter, Jr., Lea M. Metin, Helen Xu | 2014-01-14 |
| 7678462 | Spin-on-glass anti-reflective coatings for photolithography | Joseph Kennedy, Teresa Baldwin, Nigel Hacker | 2010-03-16 |
| 7012125 | Spin-on-glass anti-reflective coatings for photolithography | Joseph Kennedy, Teresa Baldwin, Nigel Hacker | 2006-03-14 |
| 6969753 | Spin-on-glass anti-reflective coatings for photolithography | Teresa Baldwin, Joseph Kennedy, Nigel Hacker | 2005-11-29 |
| 6956097 | Spin-on-glass anti-reflective coatings for photolithography | Joseph Kennedy, Teresa Baldwin, Nigel Hacker | 2005-10-18 |
| 6914114 | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography | Teresa Baldwin, Mary Richey, James Drage, Hui-Jung Wu | 2005-07-05 |
| 6824879 | Spin-on-glass anti-reflective coatings for photolithography | Teresa Baldwin, Joseph Kennedy, Nigel Hacker | 2004-11-30 |
| 6723780 | Novolac polymer planarization films with high temperature stability | Nigel Hacker, Todd Krajewski | 2004-04-20 |
| 6605362 | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography | Teresa Baldwin, Mary Richey, James Drage, Hui-Jung Wu | 2003-08-12 |
| 6517951 | Novolac polymer planarization films with high temperature stability | Nigel Hacker, Todd Krajewski | 2003-02-11 |
| 6506831 | Novolac polymer planarization films with high temperature stability | Nigel Hacker, Todd Krajewski | 2003-01-14 |
| 6506497 | Spin-on-glass anti-reflective coatings for photolithography | Joseph Kennedy, Teresa Baldwin, Nigel Hacker | 2003-01-14 |
| 6506441 | Novolac polymer planarization films with high temperature stability | Nigel Hacker, Todd Krajewski | 2003-01-14 |
| 6368400 | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography | Teresa Baldwin, Mary Richey, James Drage, Hui-Jung Wu | 2002-04-09 |
| 6365765 | Spin-on-glass anti-reflective coatings for photolithography | Teresa Baldwin, Nigel Hacker, Joseph Kennedy | 2002-04-02 |
| 6268457 | Spin-on glass anti-reflective coatings for photolithography | Joseph Kennedy, Teresa Baldwin, Nigel Hacker | 2001-07-31 |