| 6955720 |
Plasma deposition of spin chucks to reduce contamination of Silicon wafers |
Emir Gurer, Ed C. Lee |
2005-10-18 |
| 6846149 |
Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system |
Frank S. Menagh, Helder R. Carvalheira, Philip A. Troiani, Dan Cossentine, Eric R. Vaughan +1 more |
2005-01-25 |
| 6610150 |
Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system |
Frank S. Menagh, Helder R. Carvalheira, Philip A. Troiani, Dan Cossentine, Eric R. Vaughan +1 more |
2003-08-26 |
| 6242364 |
Plasma deposition of spin chucks to reduce contamination of silicon wafers |
Emir Gurer, Ed C. Lee |
2001-06-05 |
| 6177133 |
Method and apparatus for adaptive process control of critical dimensions during spin coating process |
Emir Gurer |
2001-01-23 |
| 6027760 |
Photoresist coating process control with solvent vapor sensor |
Emir Gurer, Herbert E. Litvak |
2000-02-22 |
| 5014217 |
Apparatus and method for automatically identifying chemical species within a plasma reactor environment |
— |
1991-05-07 |
| 4938555 |
Optical switch |
— |
1990-07-03 |
| D260338 |
Macrame pole |
— |
1981-08-25 |