RI

Ramaseshan Iyer

Applied Materials: 2 patents #3,641 of 7,310Top 50%
IBM: 1 patents #44,794 of 70,183Top 65%
Overall (All Time): #2,173,666 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7119016 Deposition of carbon and nitrogen doped poly silicon films, and retarded boron diffusion and improved poly depletion Ashima B. Chakravarti, Anita Madan, Woo-Hyeong Lee, Gregory DiBello 2006-10-10
6713127 Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD Janardhanan Anand Subramony, Yoshitaka Yokota, Lee Luo, Aihua Chen 2004-03-30