MD

Michelangelo Delfino

VA Varian: 6 patents #36 of 684Top 6%
FI Fairchild Camera & Instrument: 5 patents #12 of 173Top 7%
VS Varian Medical Systems: 5 patents #114 of 538Top 25%
FS Fairchild Semiconductor: 1 patents #419 of 715Top 60%
ND North American Philips Corp., Signetics Division: 1 patents #9 of 43Top 25%
📍 Mountain View, CA: #1,043 of 11,022 inventorsTop 10%
🗺 California: #28,827 of 386,348 inventorsTop 8%
Overall (All Time): #225,962 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
6907106 Method and apparatus for producing radioactive materials for medical treatment using x-rays produced by an electron accelerator Raymond D. McIntyre, Stanley W. Johnsen, Marcel Marc, Edward J. Seppi 2005-06-14
6676595 Radioactive medical implant and method of manufacturing 2004-01-13
6632167 Method and apparatus creating a radioactive layer on a receiving substrate for in vivo implantation Mary E. Day 2003-10-14
6626815 Method and apparatus creating a radioactive layer on a receiving substrate for in vivo implantation Mary E. Day 2003-09-30
6440487 Radioactive transition metal stents Mary E. Day 2002-08-27
6264595 Radioactive transition metal stents Mary E. Day 2001-07-24
6129658 Method and apparatus creating a radioactive layer on a receiving substrate for in vivo implantation Mary E. Day 2000-10-10
6078644 Carbon-backed x-ray target with coating Mary E. Day 2000-06-20
5789318 Use of titanium hydride in integrated circuit fabrication Ronald McFarland 1998-08-04
5627105 Plasma etch process and TiSi.sub.x layers made using the process Mary E. Day, Wilman Tsai 1997-05-06
5587039 Plasma etch equipment Siamak Salimian, Bu-Chin Chung 1996-12-24
5376223 Plasma etch process Siamak Salimian, Bu-Chin Chung 1994-12-27
5203631 Narrow spectral band pyrometry David T. Hodul 1993-04-20
5021358 Semiconductor fabrication process using sacrificial oxidation to reduce tunnel formation during tungsten deposition Janet M. Flanner 1991-06-04
4686113 Plasma confinement in a low pressure electrically grounded R.F. heated reactor and deposition method Bruce R. Cairns 1987-08-11
4549064 Laser treatment of silicon nitride 1985-10-22
4542037 Laser induced flow of glass bonded materials 1985-09-17
4443493 Laser induced flow glass materials 1984-04-17
4431900 Laser induced flow Ge-O based materials William I. Lehrer 1984-02-14
4415794 Laser scanning method for annealing, glass flow and related processes Timothy Reifsteck 1983-11-15