JP

Joong Jin PARK

DC Dnf Co.: 9 patents #7 of 55Top 15%
Samsung: 1 patents #49,284 of 75,807Top 70%
Overall (All Time): #540,557 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
12398459 Silicon metal oxide encapsulation film comprising metal or metal oxide in thin film, and manufacturing method therefor Myoung-Woon Kim, Sang Ick Lee, Se Jin JANG, Sung-Gi Kim, Jeong Joo PARK +7 more 2025-08-26
11901191 Atomic layer etching method and semiconductor device manufacturing method using the same Eun Hyea KO, Hee Yeon Jeong, Jun-Hee Cho, Gyu-hee Park, Byeong-il YANG +2 more 2024-02-13
11749522 Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same Sung-Gi Kim, Jeong Joo PARK, Se Jin JANG, Byeong-il YANG, Sang-Do Lee +3 more 2023-09-05
11447859 Metal triamine compound, method for preparing the same, and composition for depositing metal-containing thin film including the same Myong Woon Kim, Sang Ick Lee, Sang Jun Yim, Won Mook CHAE, Jeong Hyeon PARK +3 more 2022-09-20
11393676 Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same Sung-Gi Kim, Jeong Joo PARK, Se Jin JANG, Byeong-il YANG, Sang-Do Lee +3 more 2022-07-19
11390635 Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same Sung-Gi Kim, Byeong-il YANG, Se Jin JANG, Gun Joo PARK, Jeong Joo PARK +4 more 2022-07-19
11358974 Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition Sung-Gi Kim, Jeong Joo PARK, Se Jin JANG, Byeong-il YANG, Sang-Do Lee +3 more 2022-06-14
11319333 Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same Sung-Gi Kim, Se Jin JANG, Byeong-il YANG, Sang-Do Lee, Jeong Joo PARK +4 more 2022-05-03
10894799 Composition for depositing silicon-containing thin film including disilylamine compound and method for manufacturing silicon-containing thin film using the same Sung-Gi Kim, Se Jin JANG, Byeong-il YANG, Sang-Do Lee, Jeong Joo PARK +4 more 2021-01-19