JL

Jong-Heun Lim

Samsung: 13 patents #10,425 of 75,807Top 15%
Overall (All Time): #379,101 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10195715 Chemical mechanical polishing machine and polishing head assembly In Kwon Kim, Kyung-Hyun Kim, Ki-Jong Park, Ki-ho Bae 2019-02-05
9997534 Vertical memory devices Yong-Hoon Son, Kyung-Hyun Kim, Byeong Ju Kim, Phil Ouk Nam, Kwang-Chul Park +4 more 2018-06-12
9893077 Memory device and method of manufacturing the same Phil Ouk Nam, Yong-Hoon Son, Kyung-Hyun Kim, Byeong Ju Kim, Kwang-Chul Park +3 more 2018-02-13
9502332 Nonvolatile memory device and a method for fabricating the same Hyo Jung Kim, Ji Woon Im, Kyung-Hyun Kim 2016-11-22
9254546 Chemical mechanical polishing machine and polishing head assembly In Kwon Kim, Kyung-Hyun Kim, Ki-Jong Park, Ki-ho Bae 2016-02-09
8912592 Non-volatile memory device including etch stop layer pattern Ki-ho Bae, Hyo Jung Kim, Kyung-Hyun Kim, Chan-wook Seo, Young Beom Pyon 2014-12-16
8822287 Methods of manufacturing semiconductor devices Hyo Jung Kim, Ki-Hyun Hwang, Kyung-Hyun Kim, Han-Mei Choi, Dong-Chul Yoo +4 more 2014-09-02
8664101 Multiple mold structure methods of manufacturing vertical memory devices Hyo Jung Kim, Dae-Hong Eom, Myung-Jung Pyo, Byoung-Moon Yoon, Kyung-Hyun Kim 2014-03-04
8283248 Methods of manufacturing semiconductor devices Tae Hyun Kim, Kyung-Hyun Kim, Jae-Hwang Sim, Jae-Jin Shin, Hyun Min Park 2012-10-09
8038508 Apparatus for polishing a wafer and method for detecting a polishing end point by the same Sung-Ho Shin, Bo-Un Yoon, Chang-Ki Hong 2011-10-18
8008172 Methods of forming semiconductor devices including multistage planarization and crystalization of a semiconductor layer Chang-Ki Hong, Bo-Un Yoon, Seong-Kyu Yun, Suk-Hun Choi, Sang-Yeob Han 2011-08-30
7932163 Methods of forming stacked semiconductor devices with single-crystal semiconductor regions Chang-Ki Hong, Bo-Un Yoon, Dae-Lok Bae, Seong-Kyu Yun, Suk-Hun Choi 2011-04-26
7678625 Methods of fabricating semiconductor devices including channel layers having improved defect density and surface roughness characteristics Chang-Ki Hong, Bo-Un Yoon, Seong-Kyu Yun, Suk-Hun Choi, Sang-Yeob Han 2010-03-16