JL

Jon E. Lieberman

IBM: 2 patents #32,839 of 70,183Top 50%
NI Nikon: 1 patents #1,647 of 2,493Top 70%
Overall (All Time): #1,610,504 of 4,157,543Top 40%
3
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
6573514 Method for aligning electron beam projection lithography tool Michael S. Gordon, Christopher F. Robinson 2003-06-03
5909658 High speed electron beam lithography pattern processing system Eileen Veronica Clarke, John Kay, Christine Ann Kostek, Daniel Pierce, Robert Joseph Quickle +1 more 1999-06-01
4945246 Tri-deflection electron beam system Donald E. Davis, Cecil T. Ho, Hans C. Pfeiffer, Maris A. Sturans 1990-07-31