Issued Patents All Time
Showing 25 most recent of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10658159 | Plasma reactor vessel having improved plasma uniformity comprised of a first electrode, a second electrode opposed to the first electrode, and a third electrode between a substrate carrier and the second electrode | Omid Reza Shojaei, Fabrice Jeanneret | 2020-05-19 |
| 9045828 | RF plasma reactor having a distribution chamber with at least one grid | Emmanuel Turlot, Jean-Baptiste Chevrier, Jean Barreiro | 2015-06-02 |
| 8056504 | Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates | Laurent Sansonnens, Mustapha Elyaakoubi, Michael Irzyk | 2011-11-15 |
| 7784426 | Plasma reactor for the treatment of large size substrates | — | 2010-08-31 |
| 7687117 | Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates | Laurent Sansonnens, Mustapha Elyaakoubi, Michael Irzyk | 2010-03-30 |
| 7661388 | Plasma reactor for the treatment of large size substrates | — | 2010-02-16 |
| 7662302 | Lifting and supporting device | Mustapha Elyaakoubi | 2010-02-16 |
| 7504279 | Method for producing semi-conducting devices and devices obtained with this method | Ulrich Kroll, Cedric Bucher, Markus Poppeller, Christoph Hollenstein, Juliette Ballutaud +1 more | 2009-03-17 |
| 7487740 | Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates | Laurent Sanonnens, Mustapha Elyaakoubi, Michael Irzyk | 2009-02-10 |
| 7344909 | Method for producing semi-conducting devices and devices obtained with this method | Ulrich Kroll, Cedric Bucher, Markus Poppeller, Christoph Hollenstein, Juliette Ballutaud +1 more | 2008-03-18 |
| 7306829 | RF plasma reactor having a distribution chamber with at least one grid | Emmanuel Turlot, Jean-Baptiste Chevrier, Jean Barreiro | 2007-12-11 |
| 6890862 | Processes for vacuum treating workpieces, and corresponding process equipment | Rudolf Wagner, Jerome Perrin | 2005-05-10 |
| 6869641 | Method and apparatus for ALD on a rotary susceptor | — | 2005-03-22 |
| 6533534 | Method for improving the rate of a plasma enhanced vacuum treatment | Paul Muralt | 2003-03-18 |
| 6507145 | Ballast layer for field emissive device | Emmanuel Turlot, Hanh Pham, Francois Leblanc | 2003-01-14 |
| 6502530 | Design of gas injection for the electrode in a capacitively coupled RF plasma reactor | Emmanuel Turlot, Jean-Baptiste Chevrier, Jean Barreiro | 2003-01-07 |
| 6391377 | Process for vacuum treating workpieces, and corresponding process equipment | Rudolf Wagner, Jerome Perrin | 2002-05-21 |
| 6281469 | Capacitively coupled RF-plasma reactor | Jerome Perrin, Mustapha Elyaakoubi | 2001-08-28 |
| 6228438 | Plasma reactor for the treatment of large size substrates | — | 2001-05-08 |
| 6177129 | Process for handling workpieces and apparatus therefor | Rudolf Wagner, Jerome Perrin | 2001-01-23 |
| 6127271 | Process for dry etching and vacuum treatment reactor | Emmanuel Turlot, Philippe Grousset | 2000-10-03 |
| 6074691 | Method for monitoring the flow of a gas into a vacuum reactor | Emmanuel Turlot, Frangois Leblanc | 2000-06-13 |
| 5981899 | Capacitively coupled RF-plasma reactor | Jerome Perrin, Mustapha Elyaakoubi | 1999-11-09 |
| 5789851 | Field emission device | Emmanuel Turlot, Thierry Emeraud | 1998-08-04 |
| 5749985 | Process for optimizing multilayered tubes made of composite materials and tubes obtained through the process | Charles Sparks, Guy Metivaud, Marcel Auberon | 1998-05-12 |