Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9796063 | Multi-layered chemical-mechanical planarization pad | Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, Scott Xin Qiao, Oscar K. Hsu +2 more | 2017-10-24 |
| 9375822 | Polishing pad having micro-grooves on the pad surface | Oscar K. Hsu, Marc C. Jin, John Erik Aldeborgh | 2016-06-28 |
| 9162341 | Chemical-mechanical planarization pad including patterned structural domains | Paul Andre Lefevre, Anoop Mathew, Scott Xin Qiao, Guangwei Wu, Oscar K. Hsu | 2015-10-20 |
| 8900036 | Polishing pad having micro-grooves on the pad surface | Oscar K. Hsu, Marc C. Jin, John Erik Aldeborgh | 2014-12-02 |
| 8790165 | Multi-layered chemical-mechanical planarization pad | Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, Scott Xin Qiao, Oscar K. Hsu +2 more | 2014-07-29 |
| 8758659 | Method of grooving a chemical-mechanical planarization pad | Paul Andre Lefevre, Oscar K. Hsu, John Erik Aldeborgh, Marc C. Jin, Guangwei Wu +1 more | 2014-06-24 |
| 8684794 | Chemical mechanical planarization pad with void network | Paul Andre Lefevre, Oscar K. Hsu, Scott Xin Qiao, Anoop Mathew, Guangwei Wu | 2014-04-01 |
| 8491360 | Three-dimensional network in CMP pad | Paul Andre Lefevre, Oscar K. Hsu, Marc C. Jin, John Erik Aldeborgh | 2013-07-23 |
| 8435099 | Chemical-mechanical planarization pad including patterned structural domains | Paul Andre Lefevre, Anoop Mathew, Scott Xin Qiao, Guangwei Wu, Oscar K. Hsu | 2013-05-07 |
| 8430721 | Chemical-mechanical planarization pad | Oscar K. Hsu, Paul Andre Lefevre, Marc C. Jin, John Erik Aldeborgh | 2013-04-30 |
| 8377351 | Polishing pad with controlled void formation | Paul Andre Lefevre, Marc C. Jin, Oscar K. Hsu, John Erik Aldeborgh, Scott Xin Qiao +2 more | 2013-02-19 |
| 8172648 | Chemical-mechanical planarization pad | Paul Andre Lefevre, Oscar K. Hsu, Marc C. Jin, John Erik Aldeborgh | 2012-05-08 |
| 8137166 | Polishing pad having micro-grooves on the pad surface | Oscar K. Hsu, Marc C. Jin, John Erik Aldeborgh | 2012-03-20 |
| 7985121 | Chemical-mechanical planarization pad having end point detection window | Paul Andre Lefevre, Oscar K. Hsu, John Erik Aldeborgh, Marc C. Jin | 2011-07-26 |