Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7018282 | Customized polishing pad for selective process performance during chemical mechanical polishing | Milind Weling | 2006-03-28 |
| 6572439 | Customized polishing pad for selective process performance during chemical mechanical polishing | Milind Weling | 2003-06-03 |
| 6413152 | Apparatus for performing chemical-mechanical planarization with improved process window, process flexibility and cost | Samit Sengupta | 2002-07-02 |
| 6410440 | Method and apparatus for a gaseous environment providing improved control of CMP process | Milind Weling | 2002-06-25 |
| 6347979 | Slurry dispensing carrier ring | — | 2002-02-19 |
| 6274940 | Semiconductor wafer, a chemical-mechanical alignment mark, and an apparatus for improving alignment for metal masking in conjunction with oxide and tungsten CMP | Daniel C. Baker, Milind Weling | 2001-08-14 |
| 6241587 | System for dislodging by-product agglomerations from a polishing pad of a chemical mechanical polishing machine | Ian Robert Harvey | 2001-06-05 |
| 6190236 | Method and system for vacuum removal of chemical mechanical polishing by-products | — | 2001-02-20 |
| 6139428 | Conditioning ring for use in a chemical mechanical polishing machine | Milind Weling | 2000-10-31 |
| 6022265 | Complementary material conditioning system for a chemical mechanical polishing machine | Calvin T. Gabriel, Milind Weling, Richard Russ, David E. Henderson | 2000-02-08 |
| 5952241 | Method and apparatus for improving alignment for metal masking in conjuction with oxide and tungsten CMP | Daniel C. Baker, Milind Weling | 1999-09-14 |
| 5653622 | Chemical mechanical polishing system and method for optimization and control of film removal uniformity | Milind Weling | 1997-08-05 |