Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8449293 | Substrate treatment to reduce pattern roughness | Steven Scheer, Mark H. Somervell | 2013-05-28 |
| 8435728 | Method of slimming radiation-sensitive material lines in lithographic applications | Michael A. Carcasi, Mark H. Somervell | 2013-05-07 |
| 8338086 | Method of slimming radiation-sensitive material lines in lithographic applications | Michael A. Carcasi, Mark H. Somervell | 2012-12-25 |