GB

Gang Bai

IN Intel: 25 patents #1,576 of 30,777Top 6%
ZT Zte: 4 patents #491 of 3,593Top 15%
HE Hitachi Energy: 1 patents #135 of 458Top 30%
LL Legend (Beijing) Limited: 1 patents #2 of 13Top 20%
LL Lenovo (Beijing) Limited: 1 patents #602 of 1,308Top 50%
Overall (All Time): #110,333 of 4,157,543Top 3%
32
Patents All Time

Issued Patents All Time

Showing 25 most recent of 32 patents

Patent #TitleCo-InventorsDate
12272937 Cable module, gas-insulated device, and method for manufacturing cable module GuoZhu MENG, Zhiguo Zhang 2025-04-08
11991570 Signal transmission method and device, and computer storage medium Peng Hao, Junfeng Zhang, Xing Liu, Zhaohua Lu, Xinhui Wang +1 more 2024-05-21
11659456 Signal transmission method and device, and computer storage medium Peng Hao, Junfeng Zhang, Xing Liu, Zhaohua Lu, Xinhui Wang +1 more 2023-05-23
11190991 Signal transmission method and device, and computer storage medium Peng Hao, Junfeng Zhang, Xing Liu, Zhaohua Lu, Xinhui Wang +1 more 2021-11-30
10992409 Wireless signal transmission method and device Peng Hao, Junfeng Zhang, Feng Bi, Zhaohua Lu, Liujun Hu +1 more 2021-04-27
9899002 Information processing methods for displaying parts of an object on multiple electronic devices Fanzhi Li, Jianjun Pang, Hao Liu, Qiang Guo, Mingxu Mao 2018-02-20
9412860 Multi-layer gate dielectric 2016-08-09
8581353 Multi-layer gate dielectric 2013-11-12
8193593 Multi-layer gate dielectric 2012-06-05
7187044 Complementary metal gate electrode technology Chunlin Liang 2007-03-06
7111203 Method for implementing data backup and recovery in computer hard disk Jianfeng Hu, Peng Zhang, Wenbing Yang 2006-09-19
6998357 High dielectric constant metal oxide gate dielectrics David B. Fraser, Brian S. Doyle, Peng Cheng, Chunlin Liang 2006-02-14
6794232 Method of making MOSFET gate electrodes with tuned work function Jun Zheng, Brian S. Doyle, Chunlin Liang 2004-09-21
6790731 Method for tuning a work function for MOSFET gate electrodes Jun Zheng, Brian S. Doyle, Chunlin Liang 2004-09-14
6737710 Transistor structure having silicide source/drain extensions Peng Cheng, Brian S. Doyle 2004-05-18
6689702 High dielectric constant metal oxide gate dielectrics David B. Fraser, Brian S. Doyle, Peng Cheng, Chunlin Liang 2004-02-10
6534837 Semiconductor device Brian S. Doyle 2003-03-18
6528856 High dielectric constant metal oxide gate dielectrics David B. Fraser, Brian S. Doyle, Peng Cheng, Chunlin Liang 2003-03-04
6492217 Complementary metal gates and a process for implementation Chunlin Liang 2002-12-10
6373111 Work function tuning for MOSFET gate electrodes Jun Zheng, Brian S. Doyle, Chunlin Liang 2002-04-16
6365971 Unlanded vias with a low dielectric constant material as an intraline dielectric 2002-04-02
6265258 Method for making a complementary metal gate electrode technology Chunlin Liang 2001-07-24
6204103 Process to make complementary silicide metal gates for CMOS technology Brian S. Doyle 2001-03-20
6166417 Complementary metal gates and a process for implementation Chunlin Liang 2000-12-26
6130123 Method for making a complementary metal gate electrode technology Chunlin Liang 2000-10-10