| 8551675 |
Mounting a pellicle to a frame |
Florence Eschbach, Paul A. Zimmerman, Fu-Chang Lo |
2013-10-08 |
| 8012651 |
Mounting a pellicle to a frame |
Florence Eschbach, Paul A. Zimmerman, Fu-Chang Lo |
2011-09-06 |
| 7763395 |
Radiation stability of polymer pellicles |
Florence Eschbach, James M. Powers, Fu-Chang Lo |
2010-07-27 |
| 7469443 |
Brush for cleaning wafer |
Huey-Chiang Liou, Mansour Moinpour |
2008-12-30 |
| 7383723 |
Detecting particle agglomeration in chemical mechanical polishing slurries |
Mansour Moinpour |
2008-06-10 |
| 7316869 |
Mounting a pellicle to a frame |
Florence Eschbach, Paul A. Zimmerman, Fu-Chang Lo |
2008-01-08 |
| 7314667 |
Process to optimize properties of polymer pellicles and resist for lithography applications |
Florence Eschbach, Fu-Chang Lo, Susan Holl |
2008-01-01 |
| 7288299 |
Fullerenes to increase radiation resistance in polymer-based pellicles |
Tim Chen, Susan Holl |
2007-10-30 |
| 7288300 |
Fullerenes to increase radiation resistance in polymer-based pellicles |
Tim Chen, Susan Holl |
2007-10-30 |
| 7264853 |
Attaching a pellicle frame to a reticle |
Florence Eschbach, Paul A. Zimmerman, Fu-Chang Lo |
2007-09-04 |
| 7048610 |
Conditioning polishing pad for chemical-mechanical polishing |
Mansour Moinpour, Victor K. Souw |
2006-05-23 |