Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12391126 | Method for increasing the power during an acceleration process of an electrically operated motor vehicle | Thomas Traidl, Simon Kaimer | 2025-08-19 |
| 8766447 | Dense seed layer and method of formation | — | 2014-07-01 |
| 8501373 | Passivation of multi-layer mirror for extreme ultraviolet lithography | Siegfried Schwarzl | 2013-08-06 |
| 8148821 | Dense seed layer and method of formation | — | 2012-04-03 |
| 8076055 | Passivation of multi-layer mirror for extreme ultraviolet lithography | Siegfried Schwarzl | 2011-12-13 |
| 7859648 | Passivation of multi-layer mirror for extreme ultraviolet lithography | Siegfried Schwarzl | 2010-12-28 |
| 7760341 | Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes | Vivek Bakshi | 2010-07-20 |
| 7709816 | Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) light sources used in semiconductor fabrication | Vivek Bakshi, Kevin Kemp | 2010-05-04 |
| 7626682 | Reticle stages for lithography systems and lithography methods | Siegfried Schwarzl | 2009-12-01 |
| 7586059 | Lithography mask substrate labeling system | Thomas White | 2009-09-08 |
| 7576005 | Dense seed layer and method of formation | — | 2009-08-18 |
| 7547505 | Methods of forming capping layers on reflective materials | Nora V. Edwards | 2009-06-16 |
| 7417736 | Method for determining a radiation power and an exposure apparatus | Siegfried Schwarzl | 2008-08-26 |
| 7407729 | EUV magnetic contrast lithography mask and manufacture thereof | Siegfried Schwarzl | 2008-08-05 |
| 7323821 | Device for generating and/or influencing electromagnetic radiation from a plasma | Siegfried Schwarzl | 2008-01-29 |
| 7294851 | Dense seed layer and method of formation | — | 2007-11-13 |
| 7250620 | EUV lithography filter | Vivek Bakshi | 2007-07-31 |
| 7078134 | Photolithographic mask having a structure region covered by a thin protective coating of only a few atomic layers and methods for the fabrication of the mask including ALCVD to form the thin protective coating | Siegfried Schwarzl | 2006-07-18 |
| 7029808 | Photosensitive coating material for a substrate and process for exposing the coated substrate | Jenspeter Rau, Siegfried Schwarzl | 2006-04-18 |
| 6864175 | Method for fabricating integrated circuit arrangements, and associated circuit arrangements, in particular tunnel contact elements | Manfred Engelhardt | 2005-03-08 |
| 6849365 | Reflection mask for EUV-lithography and method for fabricating the reflection mask | Siegfried Schwarzl | 2005-02-01 |
| 5034611 | Method for non-destructive identification for electronic inhomogeneities in semiconductor layers | Peter Alpern, Dominique Savignac | 1991-07-23 |