Issued Patents All Time
Showing 26–43 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7170125 | Capacitor with electrodes made of ruthenium and method for patterning layers made of ruthenium or ruthenium | Martin Gutsche | 2007-01-30 |
| 7157371 | Barrier layer and a method for suppressing diffusion processes during the production of semiconductor devices | Thomas Hecht, Uwe Schroeder, Martin Gutsche, Stefan Jakschik, Stephan Kudelka +1 more | 2007-01-02 |
| 7138677 | Capacitor arrangement with capacitors arranged one in the other | Martin Gutsche | 2006-11-21 |
| 7122423 | Method for fabricating a memory cell | Martin Gutsche | 2006-10-17 |
| 7112487 | Method for fabricating a stacked capacitor array having a regular arrangement of a plurality of stacked capacitors | Martin Gutsche | 2006-09-26 |
| 7087485 | Method of fabricating an oxide collar for a trench capacitor | Martin Gutsche, Thomas Hecht | 2006-08-08 |
| 7084454 | Nonvolatile integrated semiconductor memory | Cay-Uwe Pinnow, Martin Gutsche, Thomas Happ | 2006-08-01 |
| 7074689 | Method for fabricating a trench capacitor having an insulation collar, which is electrically connected to a substrate on one side via a buried contact, in particular for a semiconductor memory cell | Martin Gutsche | 2006-07-11 |
| 6977405 | Semiconductor memory with memory cells comprising a vertical selection transistor and method for fabricating it | Jorn Lutzen, Bernd Goebel, Dirk Schumann, Martin Gutsche, Martin Popp +2 more | 2005-12-20 |
| 6953722 | Method for patterning ceramic layers | Martin Gutsche, Thomas Hecht, Stefan Jakschik, Stephan Kudelka, Uwe Schroder +1 more | 2005-10-11 |
| 6949269 | Method for producing vertical patterned layers made of silicon dioxide | Martin Gutsche | 2005-09-27 |
| 6916704 | Multiple deposition of metal layers for the fabrication of an upper capacitor electrode of a trench capacitor | Martin Gutsche, Bernhard Sell, Annette Sanger | 2005-07-12 |
| 6853023 | Semiconductor memory cell configuration and a method for producing the configuration | Bernd Goebel, Jorn Lutzen, Martin Popp | 2005-02-08 |
| 6835417 | Method and device for depositing thin layers via ALD/CVD processes in combination with rapid thermal processes | Annette Saenger, Bernhard Sell, Thomas Hecht, Martin Gutsche | 2004-12-28 |
| 6774005 | Method for fabricating a metal carbide layer and method for fabricating a trench capacitor containing a metal carbide | Martin Gutsche, Peter Moll, Bernhard Sell, Annette Sanger | 2004-08-10 |
| 6693016 | Method of fabricating a trench-structure capacitor device | Martin Gutsche, Thomas Hecht, Matthias Leonhardt, Uwe Schroder | 2004-02-17 |
| 6653185 | Method of providing trench walls by using two-step etching processes | Martin Gutsche | 2003-11-25 |
| 6620724 | Low resistivity deep trench fill for DRAM and EDRAM applications | Uwe Schroeder, Helmut Tews, Irene McStay, Manfred Hauf, Matthias Goldbach +5 more | 2003-09-16 |