Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8319295 | Use of F-based gate etch to passivate the high-k/metal gate stack for deep submicron transistor technologies | Nadine Collaert, Paul A. Zimmerman, Marc Demand, Adelina K. Shickova | 2012-11-27 |
| 7611986 | Dual damascene patterning method | Jan Van Olmen, Marleen Van Hove, Herbert Struyf, Dirk Hendrickx, Serge Vanhaelemeersch | 2009-11-03 |
| 6352936 | Method for stripping ion implanted photoresist layer | Christian Jehoul, Kristel Van Baekel, Herbert Struyf, Serge Vanhaelemeersch | 2002-03-05 |