Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8319295 | Use of F-based gate etch to passivate the high-k/metal gate stack for deep submicron transistor technologies | Nadine Collaert, Paul A. Zimmerman, Werner Boullart, Adelina K. Shickova | 2012-11-27 |
| 7598184 | Plasma composition for selective high-k etch | Denis Shamiryan, Vasile Paraschiv | 2009-10-06 |
| 7521369 | Selective removal of rare earth based high-k materials in a semiconductor device | Denis Shamiryan, Vasile Paraschiv | 2009-04-21 |
| 7390708 | Patterning of doped poly-silicon gates | Denis Shamiryan, Vasile Paraschiv | 2008-06-24 |