JB

John Batey

IBM: 9 patents #11,918 of 70,183Top 20%
QU Qualcomm: 5 patents #3,272 of 12,104Top 30%
IL Id&C Limited: 2 patents #13 of 26Top 50%
Overall (All Time): #299,700 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
8368124 Electromechanical devices having etch barrier layers Mark W. Miles, Clarence Chui, Manish Kothari 2013-02-05
8278726 Controlling electromechanical behavior of structures within a microelectromechanical systems device Mark W. Miles, Clarence Chui, Manish Kothari, Ming-Hau Tung 2012-10-02
7781850 Controlling electromechanical behavior of structures within a microelectromechanical systems device Mark W. Miles, Clarence Chui, Manish Kothari, Ming-Hau Tung 2010-08-24
7704772 Method of manufacture for microelectromechanical devices Ming-Hau Tung, Brian J. Gally, Manish Kothari, Clarence Chui 2010-04-27
7580172 MEMS device and interconnects for same Alan G. Lewis, Manish Kothari, Teruo Sasagawa, Ming-Hau Tung, Gregory D. U'Ren +1 more 2009-08-25
7550794 Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer Mark W. Miles, Clarence Chui, Manish Kothari 2009-06-23
7476327 Method of manufacture for microelectromechanical devices Ming-Hau Tung, Brian J. Gally, Manish Kothari, Clarence Chui 2009-01-13
6545295 Transistor having ammonia free nitride between its gate electrode and gate insulation layers Peter M. Fryer, Jun-Hyung Souk 2003-04-08
6420282 Passivation of copper with ammonia-free silicon nitride and application to TFT/LCD Peter M. Fryer, Jun-Hyung Souk 2002-07-16
6165917 Passivation of copper with ammonia-free silicon nitride and application to TFT/LCD Peter M. Fryer, Jun-Hyung Souk 2000-12-26
5831283 Passivation of copper with ammonia-free silicon nitride and application to TFT/LCD Peter M. Fryer, Jun-Hyung Souk 1998-11-03
5242530 Pulsed gas plasma-enhanced chemical vapor deposition of silicon John J. Boland, Gregory N. Parsons 1993-09-07
5086321 Unpinned oxide-compound semiconductor structures and method of forming same Sandip Tiwari, Steven L. Wright 1992-02-04
5068124 Method for depositing high quality silicon dioxide by PECVD Elaine Tierney 1991-11-26
4998152 Thin film transistor Rajiv V. Joshi 1991-03-05
4987095 Method of making unpinned oxide-compound semiconductor structures Sandip Tiwari, Steven L. Wright 1991-01-22