NH

Nobuaki Hayashi

HI Hitachi: 17 patents #2,231 of 28,497Top 8%
HD Hitachi Displays: 7 patents #142 of 752Top 20%
PA Panasonic: 5 patents #5,165 of 21,108Top 25%
HC Hitachi Chemical Company: 3 patents #513 of 1,946Top 30%
Honda Motor Co.: 3 patents #6,619 of 21,052Top 35%
NT Nippei Toyama: 3 patents #12 of 72Top 20%
SO Sony: 2 patents #12,963 of 25,231Top 55%
NM Nippon Micrometal: 2 patents #16 of 39Top 45%
LU Lumileds Lighting Us: 1 patents #77 of 139Top 60%
📍 Osaka, JP: #98 of 258 inventorsTop 40%
Overall (All Time): #75,250 of 4,157,543Top 2%
41
Patents All Time

Issued Patents All Time

Showing 26–41 of 41 patents

Patent #TitleCo-InventorsDate
5173382 Photosensitive composition containing water-soluble binder and aromatic diazonium chromate forming fluorescent screens employing same Hajime Morishita, Saburo Nonogaki, Masato Ito, Masahiro Nishizawa, Kiyoshi Miura 1992-12-22
5118582 Pattern forming material and process for forming pattern using the same Takumi Ueno, Hiroshi Shiraishi, Emiko Fukuma, Keiko Tadano 1992-06-02
5081394 Black matrix color picture tube Hajime Morishita, Saburo Nonogaki, Masahiro Nishizawa, Kiyoshi Miura, Teruki Suzuki 1992-01-14
5024920 Process for forming a pattern using a photosensitive azide and a high-molecular weight copolymer or polymer Hajime Morishita, Saburo Nonogaki, Michiaki Hashimoto, Masato Ito, Masahiro Nishizawa +2 more 1991-06-18
4877070 Method of reinforcing a guitar neck 1989-10-31
4857429 Process of improving optical contact of patternwise powdery coating layer and phosphor screen provided therefore Shoichi Uchino, Yoshifumi Tomita, Saburo Nonogaki, Masahiro Nishizawa 1989-08-15
4815821 Face plate for display Saburo Nonogaki, Hajime Morishita, Shoichi Uchino, Yoshifumi Tomita, Masahiro Nishizawa +1 more 1989-03-28
4735880 Photosensitive composition and pattern forming process using same Hajime Morishita, Saburo Nonogaki, Shoichi Uchino, Masahiro Nishizawa, Kiyoshi Miura +2 more 1988-04-05
4722881 Radiation-sensitive resist composition with an admixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane Takumi Ueno, Hiroshi Shiraishi, Takashi Nishida 1988-02-02
4537851 Process of forming powder pattern using positive diazonium salt photoresist Saburo Nonogaki, Yoshifumi Tomita 1985-08-27
4520094 Process for forming powder pattern on light exposed layer having photosensitive diazonium salts Hajime Morishita, Motoo Akagi, Saburo Nonogaki, Shoichi Uchino, Takahiro Kohashi 1985-05-28
4510226 Photosensitive composition and pattern forming process using same Hajime Morishita, Motoo Akagi, Saburo Nonogaki, Shoichi Uchino 1985-04-09
4409313 Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine Hajime Morishita, Takahiro Kohashi, Saburo Nonogaki, Motoo Akagi, Shoichi Uchino 1983-10-11
4377630 Photosensitive composition Hajime Morishita, Takahiro Kohashi, Saburo Nonogaki, Motoo Akagi, Shoichi Uchino 1983-03-22
4332874 Photosensitive bis-azide composition with acrylic terpolymer and pattern-forming method Motoo Akagi, Kiyoshi Miura, Yoshiyuki Odaka 1982-06-01
D258290 Electric guitar 1981-02-17