| 9748081 |
Method of manufacturing semiconductor device and sputtering apparatus |
Takashi HAMAYA, Hidenori Suzuki |
2017-08-29 |
| 7566662 |
Method of dry cleaning silicon surface prior to forming self-aligned nickel silicide layer |
Takuya Futase, Mitsuo Kimoto, Hidenori Suzuki |
2009-07-28 |
| 7088001 |
Semiconductor integrated circuit device with a metallization structure |
Hiroshi Ashihara, Tatsuyuki Saito, Uitsu Tanaka, Hidenori Suzuki, Yasuko Yoshida +1 more |
2006-08-08 |
| 6780757 |
Semiconductor integrated circuit device and method for making the same |
Masayuki Suzuki, Shinji Nishihara, Masashi Sahara, Shinichi Ishida, Hiromi Abe +3 more |
2004-08-24 |
| 6764945 |
Method of manufacturing a multilayer metallization structure with non-directional sputtering method |
Hiroshi Ashihara, Tatsuyuki Saito, Uitsu Tanaka, Hidenori Suzuki, Yasuko Yoshida +1 more |
2004-07-20 |
| 6583049 |
Semiconductor integrated circuit device and method for making the same |
Masayuki Suzuki, Shinji Nishihara, Masashi Sahara, Shinichi Ishida, Hiromi Abe +3 more |
2003-06-24 |
| 6538329 |
Semiconductor integrated circuit device and method for making the same |
Masayuki Suzuki, Shinji Nishihara, Masashi Sahara, Shinichi Ishida, Hiromi Abe +3 more |
2003-03-25 |
| 6372554 |
Semiconductor integrated circuit device and method for production of the same |
Keizo Kawakita, Kazuhiko Kajigaya, Seiji Narui, Kiyoshi Nakai, Kazunari Suzuki +1 more |
2002-04-16 |
| 6300237 |
Semiconductor integrated circuit device and method for making the same |
Masayuki Suzuki, Shinji Nishihara, Masashi Sahara, Shinichi Ishida, Hiromi Abe +3 more |
2001-10-09 |
| 5904556 |
Method for making semiconductor integrated circuit device having interconnection structure using tungsten film |
Masayuki Suzuki, Shinji Nishihara, Masashi Sahara, Shinichi Ishida, Hiromi Abe +3 more |
1999-05-18 |