Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10155886 | Polishing liquid for CMP, and polishing method | Toshio Takizawa, Hisataka Minami, Toshiaki Akutsu, Tomohiro Iwano | 2018-12-18 |
| 9966269 | Polishing liquid for CMP, polishing liquid set for CMP, and polishing method | Shigeru Yoshikawa, Takaaki Tanaka, Takashi Shinoda | 2018-05-08 |
| 9564337 | Polishing liquid and method for polishing substrate using the polishing liquid | Takaaki Tanaka, Toshio Takizawa, Shigeru Yoshikawa, Takaaki Matsumoto, Takahiro Yoshikawa +1 more | 2017-02-07 |
| 9022834 | Polishing solution for CMP and polishing method using the polishing solution | Eiichi Satou, Kanshi Chinone, Shigeru Nobe, Kazuhiro Enomoto, Tadahiro Kimura +3 more | 2015-05-05 |
| 8853082 | Polishing liquid for CMP and polishing method using the same | Masayuki Hanano, Eiichi Satou, Kanshi Chinone | 2014-10-07 |
| 8592317 | Polishing solution for CMP and polishing method using the polishing solution | Eiichi Satou, Shigeru Nobe, Masayuki Hanano, Shigeru Yoshikawa | 2013-11-26 |