Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9022834 | Polishing solution for CMP and polishing method using the polishing solution | Eiichi Satou, Munehiro Oota, Shigeru Nobe, Kazuhiro Enomoto, Tadahiro Kimura +3 more | 2015-05-05 |
| 8853082 | Polishing liquid for CMP and polishing method using the same | Masayuki Hanano, Eiichi Satou, Munehiro Oota | 2014-10-07 |
| 8439995 | Abrasive compounds for semiconductor planarization | — | 2013-05-14 |
| 8328893 | Method of producing oxide particles, slurry, polishing slurry, and method of polishing substrate | Takafumi Sakurada, Daisuke Hosaka | 2012-12-11 |
| 8323604 | Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurry | Seiji Miyaoka | 2012-12-04 |