Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406197 | Prediction and metrology of stochastic photoresist thickness defects | Anatoly Burov, Guy Parsey, Kunlun Bai, Pradeep Vukkadala, Cao Zhang +2 more | 2025-09-02 |
| 10782606 | Photolithography methods and structures that reduce stochastic defects | Yong Liang, Lei Sun, Yongan Xu | 2020-09-22 |
| 10353288 | Litho-litho-etch double patterning method | Vineet Sharma, Sohan S. Mehta, Sunil Kumar Singh, Feng Wang | 2019-07-16 |