| 7311586 |
Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure |
Jason Price, Scott Chin, Jiro Kajiwara, Malik Charif |
2007-12-25 |
| 7044838 |
Chemical mechanical polishing head assembly having floating wafer carrier and retaining ring |
Scott Chin, John Geraghty, William Dyson, Jr., Tanlin Dickey |
2006-05-16 |
| 7029382 |
Apparatus for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure |
Jason Price, Scott Chin, Jiro Kajiwara, Malik Charif |
2006-04-18 |
| 6368189 |
Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure |
Jason Price, Scott Chin, Jiro Kajiwara, Malek Charif |
2002-04-09 |
| 6231428 |
Chemical mechanical polishing head assembly having floating wafer carrier and retaining ring |
Scott Chin, John Geraghty, William Dyson, Jr., Tanlin Dickey |
2001-05-15 |