Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7311586 | Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure | Gerard S. Maloney, Jason Price, Scott Chin, Jiro Kajiwara | 2007-12-25 |
| 7029382 | Apparatus for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure | Gerard S. Maloney, Jason Price, Scott Chin, Jiro Kajiwara | 2006-04-18 |