Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9941114 | Organometallic precursors and methods of forming thin layers using the same | Youn-Joung Cho, Youn Soo Kim, Sang Jun Yim, Myong Woon Kim, Sang-Chul Youn | 2018-04-10 |
| 9926394 | Cyclopenta[b]fluorenyl transition metal compound, catalyst composition containing the same, and method of preparing ethylene homopolymer or copolymer of ethylene and alpha-olefin using the same | Dong Cheol Shin, Ho Seong Lee, Seong Kyun Kim, Sun Young Kim, Jong Sok Hahn +2 more | 2018-03-27 |
| 9916974 | Amino-silyl amine compound and the manufacturing method of dielectric film containing Si—N bond by using atomic layer deposition | Se Jin JANG, Sang-Do Lee, Jong Hyun Kim, Sung-Gi Kim, Sang Yong Jeon +3 more | 2018-03-13 |
| 9809608 | Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same | Se Jin JANG, Byeong-il YANG, Sung-Gi Kim, Jong Hyun Kim, Do Yeon Kim +3 more | 2017-11-07 |
| 9586979 | Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same | Se Jin JANG, Sang-Do Lee, Sung-Gi Kim, Byeong-il YANG, Jang-Hyeon Seok +1 more | 2017-03-07 |
| 9514857 | Zinc oxide precursor and method of depositing zinc oxide-based thin film using the same | Sooho Park, Jongse Park, Young Zo Yoo, Joo Young Lee, Seo Hyun Kim +6 more | 2016-12-06 |
| 9245740 | Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same | Se Jin JANG, Sang-Do Lee, Sung-Gi Kim, Jong Hyun Kim, Byeong-il YANG +2 more | 2016-01-26 |
| 9130230 | Negative electrode active material with improved safety, and secondary battery comprising same | Do-young Seung, Tae-hyun Jeon, Ki Joo Hong, Ung Ju Lee, Dong Shin Kim | 2015-09-08 |
| 9120884 | Cyclopenta[b]fluorenyl transition metal compound, catalyst composition containing the same, and method of preparing ethylene homopolymer or copolymer of ethylene and α-olefin using the same | Dong Cheol Shin, Ho Seong Lee, Seong Kyun Kim, Sun Young Kim, Jong Sok Hahn +2 more | 2015-09-01 |
| 9031799 | Remote electrical safety diagnosis system and apparatus | Seok Bae, Gi Hyun Kim | 2015-05-12 |
| 8932389 | Zinc oxide precursor and method of depositing zinc oxide-based thin film using the same | Sooho Park, Seohyun Kim, Jeongwoo Park, Taejung Park, YoungZo Yoo +8 more | 2015-01-13 |
| 8921499 | Method of preparing ethylene-α-olefin-diene copolymer | Dong Cheol Shin, Ho Seong Lee, Seong Kyun Kim, Sun Young Kim, Jong Sok Hahn +2 more | 2014-12-30 |
| 8858694 | Zinc oxide precursor containing alkyl zinc halide and method of depositing zinc oxide-based thin film using the same | Sooho Park, Seohyun Kim, Jeongwoo Park, Taejung Park, Young Zo Yoo +8 more | 2014-10-14 |
| 7271088 | Slurry composition with high planarity and CMP process of dielectric film using the same | Jong Goo Jung, Hyung-Soon Park | 2007-09-18 |
| 7145763 | High-voltage electric double layer capacitor | Yu-Tack Kim, Moon-Bae Lee, Sang Hyun Lee, Chul Wan Park, Jin-Bae Park +3 more | 2006-12-05 |
| 7119015 | Method for forming polysilicon plug of semiconductor device | Hyung-Soon Park, Min-Suk Lee, Hyun-Chul Sohn | 2006-10-10 |
| 7045450 | Method of manufacturing semiconductor device | Jong-Han Shin, Hyung-Soon Park | 2006-05-16 |
| 7018924 | CMP slurry compositions for oxide films and methods for forming metal line contact plugs using the same | Jong Goo Jung | 2006-03-28 |
| 6939759 | Method for manufacturing capacitor of semiconductor device | Jong-Han Shin | 2005-09-06 |
| 6933226 | Method of forming a metal gate in a semiconductor device | Hyung Hwan Kim, Se-Aug Jang | 2005-08-23 |
| 6790678 | Method for forming capacitor of ferroelectric random access memory | Seo Young SONG | 2004-09-14 |
| 6746314 | Nitride CMP slurry having selectivity to nitride | Hyung Hwan Kim | 2004-06-08 |
| 6663480 | Polishing pad for semiconductor and optical parts, and method for manufacturing the same | Hae-Do Jeong, Ho Sik Lee, Ho Youn Kim, Chul Woo Nam, Jae Hong Kim | 2003-12-16 |
| 6391697 | Method for the formation of gate electrode of semiconductor device using a difference in polishing selection ratio between polymer and oxide film | — | 2002-05-21 |