AI

Akira Izumi

DC Dainippon Screen Mfg. Co.: 21 patents #10 of 977Top 2%
CC Citizen Watch Co.: 6 patents #168 of 1,225Top 15%
AN Anelva: 3 patents #57 of 280Top 25%
NI Nikon: 3 patents #1,048 of 2,493Top 45%
UN Unknown: 3 patents #7,366 of 83,584Top 9%
TI Toyota Industries: 3 patents #276 of 955Top 30%
KT Kyushu Institute Of Technology: 2 patents #46 of 237Top 20%
NE Nec: 2 patents #5,510 of 14,502Top 40%
TO Toyota: 2 patents #10,861 of 26,838Top 45%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
ND Nec Compound Semiconductor Devices: 1 patents #19 of 87Top 25%
JT Japan Tobacco: 1 patents #582 of 1,187Top 50%
SC Screen Holdings Co.: 1 patents #452 of 686Top 70%
SC Shin-Etsu Chemical Co.: 1 patents #1,340 of 2,176Top 65%
CC Citizen Holdings Co.: 1 patents #208 of 431Top 50%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
MC Mitsui Chemicals: 1 patents #1,270 of 2,279Top 60%
Overall (All Time): #62,744 of 4,157,543Top 2%
46
Patents All Time

Issued Patents All Time

Showing 26–46 of 46 patents

Patent #TitleCo-InventorsDate
6723664 Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction Hideki Matsumura, Atsushi Masuda, Yasunobu Nashimoto, Yosuke Miyoshi, Shuji Nomura +2 more 2004-04-20
6703254 Method for manufacturing semiconductor laser device Kimihiko Saitoh, Hideki Matsumura 2004-03-09
6669808 Substrate processing apparatus and substrate processing method Hideki Adachi, Katsuhiko Miya, Itsuki Kajino 2003-12-30
6446646 Substrate processing apparatus 2002-09-10
6349669 Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction Hideki Matsumura, Atsushi Masuda, Yasunobu Nashimoto, Yosuke Miyoshi, Shuji Nomura +2 more 2002-02-26
6077321 Wet/dry substrate processing apparatus Hideki Adachi 2000-06-20
6069094 Method for depositing a thin film Hideki Matsumura, Atsushi Masuda, Yasunobu Nashimoto, Yosuke Miyoshi, Shuji Nomura +2 more 2000-05-30
D418117 Computer Adam Wade, Hideto Iwamoto 1999-12-28
5927303 Substrate processing apparatus Katsuhiko Miya 1999-07-27
5927306 Ultrasonic vibrator, ultrasonic cleaning nozzle, ultrasonic cleaning device, substrate cleaning device, substrate cleaning treatment system and ultrasonic cleaning nozzle manufacturing method Tetsuo Kawakatsu 1999-07-27
5916366 Substrate spin treating apparatus Tsutomu Ueyama, Hideki Adachi 1999-06-29
5571375 Method of removing native oxide film from a contact hole on silicon wafer Takeshi Matsuka 1996-11-05
5520857 Liquid agent evaporator Tsuyoshi Matsuka, Tsutomu Takeuchi 1996-05-28
5495792 Double acting hydraulic cylinder with improved lubrication and piston rod guides Toshiyuki Takeuchi 1996-03-05
5333701 Instrument panel for industrial vehicle 1994-08-02
5112437 Oxide film removing apparatus and removing method thereof using azeotropic vapor mixture Nobuatsu Watanabe, Yong-Bo Chong, Toshio Tatsuno, Tomoyoshi Okada, Keiji Toei 1992-05-12
5022961 Method for removing a film on a silicon layer surface Keiji Toei, Nobuatsu Watanabe, Yong-Bo Chong 1991-06-11
4877909 Process for reducing aldehydes or ketones Sigenobu Mizusaki, Hajime Matsushita, Shigeo Ishiguro, Hiroshi Ichinose 1989-10-31
4846499 Devices for supporting an LPG tank bracket of an LPG fork lift Ichiro Nagasaka 1989-07-11
4840417 Movable yoke-type lifting magnet device Tomomi Kishi, Hideo Niwa 1989-06-20
4788584 RF transistor package with capacitor Yutaka Hirano, Masanobu Itoh, Yoshikazu Dooi 1988-11-29