Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11366256 | Diffractive optical element | — | 2022-06-21 |
| 11340389 | Diffractive optical element | — | 2022-05-24 |
| 10768347 | Diffractive optical element and light irradiation device | Yuichi Miyazaki, Hidenori Yoshioka | 2020-09-08 |
| 10704763 | Diffractive optical element and light irradiation apparatus | Yuichi Miyazaki, Hidenori Yoshioka | 2020-07-07 |
| 10591133 | Diffractive optical element and light irradiation apparatus | Yuichi Miyazaki, Hidenori Yoshioka | 2020-03-17 |
| 8259290 | Diffractive optical device, and aligner comprising that device | Ryuji Horiguchi | 2012-09-04 |
| 8124301 | Gradated photomask and its fabrication process | Junji Fujikawa, Shu Shimada, Yuuichi Yoshida, Shiho Sasaki, Tsuyoshi Amano +2 more | 2012-02-28 |
| 7968255 | Photomask | Yasuhisa Kitahata, Yasutaka Morikawa, Takashi Adachi, Yuichi Inazuki, Takanori Sutou | 2011-06-28 |
| 7367010 | Designing method and device for phase shift mask | Kei Mesuda | 2008-04-29 |
| 7297386 | Antireflection structure | Toshiyuki Suzuki, Arimichi Ito | 2007-11-20 |
| 7287240 | Designing method and device for phase shift mask | Yasutaka Morikawa, Kei Mesuda | 2007-10-23 |
| 7117140 | Method of evaluating the exposure property of data to wafer | — | 2006-10-03 |
| 7067221 | Designing method and device for phase shift mask | Kei Mesuda | 2006-06-27 |
| 6821683 | METHOD FOR CORRECTING DESIGN PATTERN OF SEMICONDUCTOR CIRCUIT, A PHOTOMASK FABRICATED USING THE CORRECTED DESIGN PATTERN DATA, A METHOD FOR INSPECTING THE PHOTOMASK AND A METHOD FOR GENERATING PATTERN DATA FOR INSPECTION OF PHOTOMASK | Naoki Shimohakamada, Wakahiko Sakata | 2004-11-23 |
| 6694500 | Design circuit pattern for test of semiconductor circuit | — | 2004-02-17 |
| 6656664 | Method of forming minute focusing lens | Yoichi Takahashi, Hiroyuki Matsui | 2003-12-02 |
| 6560767 | Process for making photomask pattern data and photomask | Naoki Shimohakamada, Wakahiko Sakata | 2003-05-06 |
| 6523163 | Method for forming pattern data and method for writing a photomask with additional patterns | — | 2003-02-18 |