Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6821683 | METHOD FOR CORRECTING DESIGN PATTERN OF SEMICONDUCTOR CIRCUIT, A PHOTOMASK FABRICATED USING THE CORRECTED DESIGN PATTERN DATA, A METHOD FOR INSPECTING THE PHOTOMASK AND A METHOD FOR GENERATING PATTERN DATA FOR INSPECTION OF PHOTOMASK | Nobuhito Toyama, Wakahiko Sakata | 2004-11-23 |
| 6560767 | Process for making photomask pattern data and photomask | Nobuhito Toyama, Wakahiko Sakata | 2003-05-06 |