TS

Tsuyoshi Shibata

Canon: 44 patents #929 of 19,416Top 5%
KT Kabushiki Kaisha Toshiba: 16 patents #1,863 of 21,451Top 9%
TL Tokyo Electron Limited: 9 patents #845 of 5,567Top 20%
HI Hitachi: 6 patents #6,582 of 28,497Top 25%
MS Mitsubishi Hitachi Power Systems: 1 patents #495 of 970Top 55%
NE Nec: 1 patents #7,889 of 14,502Top 55%
📍 Tokyo, NY: #21 of 99 inventorsTop 25%
Overall (All Time): #24,272 of 4,157,543Top 1%
77
Patents All Time

Issued Patents All Time

Showing 51–75 of 77 patents

Patent #TitleCo-InventorsDate
7083255 Ink jet printing apparatus and ink jet printing method Seiichiro Karita, Hiroyuki Ogino 2006-08-01
7070253 Ink-jet printing method and apparatus Masataka Yashima 2006-07-04
7000215 Method of and computer program product for designing patterns, and method of manufacturing semiconductor device Ayako Nakano, Koji Hashimoto, Takashi Sato, Yuji Kobayashi 2006-02-14
6953238 Recording apparatus and recording method and program Noribumi Koitabashi, Masataka Yashima 2005-10-11
6908176 Recording apparatus and method Noribumi Koitabashi, Masataka Yashima 2005-06-21
6854822 Ink-jet printing method and apparatus Masataka Yashima 2005-02-15
6834927 Ink jet recording apparatus and correcting method for image Masataka Yashima, Noribumi Koitabashi, Hitoshi Tsuboi, Yasunori Fujimoto 2004-12-28
6834926 Ink-jet printing apparatus and method, and computer readable memory 2004-12-28
6814879 Method for forming pattern 2004-11-09
6779865 Ink jet printing method and apparatus Noribumi Koitabashi, Masataka Yashima, Hitoshi Tsuboi 2004-08-24
6540328 Printing apparatus and printing method Masataka Yashima, Katsumi Aoki 2003-04-01
6533382 Ink-jet recording method, ink-jet recording apparatus, computer-readable medium, and program Yoshinori Tomida, Osamu Kanome 2003-03-18
6530638 Image processing apparatus, printing apparatus and storage medium Noribumi Koitabashi, Masataka Yashima, Hitoshi Tsuboi 2003-03-11
6471323 Ink jet printing method and apparatus Noribumi Koitabashi, Masataka Yashima 2002-10-29
6164747 Recording apparatus and method of controlling same Masataka Yashima, Kenichi Suzuki, Keiji Ohkoda, Akihiro Mouri, Osamu Kanome +2 more 2000-12-26
5897982 Resist develop process having a post develop dispense step Eric A. Lehner 1999-04-27
5812227 Liquid crystal device, display apparatus using same and display method using same Yomishi Toshida, Kazuo Yoshinaga, Toshikazu Ohnishi, Koichi Sato, Takeo Eguchi 1998-09-22
5744293 Semiconductor device having antireflective layer containing organic resin with dispersed carbon particles Katsuya Okumura 1998-04-28
5648198 Resist hardening process having improved thermal stability 1997-07-15
5543252 Method for manufacturing exposure mask and the exposure mask Koji Hashimoto, Katsuhiko Heida, Kenji Kawano, Shinichi Ito, Keiji Horioka 1996-08-06
5533452 Method of peeling a release film from a photosensitive plate blank Akihiro Mouri, Yuji Kondo 1996-07-09
5475515 Liquid crystal device having a stretched porous polymer film impregnated with a low molecular weight mesomorphic compound Kazuo Yoshinaga, Ryoji Fujiwara, Yomishi Toshida, Toshikazu Ohnishi, Koichi Sato +1 more 1995-12-12
5473448 Display device having a mesomorphic diffraction grating layer adjacent a polymer dispersed layer Kazuo Yoshinaga, Hajime Sakata, Yomishi Toshida, Toshikazu Ohnishi, Koichi Sato +1 more 1995-12-05
5468576 Method for manufacturing exposure mask Koji Hashimoto, Katsuhiko Hieda 1995-11-21
5422205 Micropattern forming method Soichi Inoue, Ichiro Mori 1995-06-06