Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6800255 | System and method for the abatement of toxic constituents of effluent gases | Steven M. Browne, James L. Flack, Mark Mitchell | 2004-10-05 |
| 6670242 | Method for making an integrated circuit device including a graded, grown, high quality gate oxide layer and a nitride layer | Yi Ma, Pradip K. Roy | 2003-12-30 |
| 6548422 | Method and structure for oxide/silicon nitride interface substructure improvements | Pradip K. Roy, Carlos M. Chacon | 2003-04-15 |
| 6380606 | Locos isolation process using a layered pad nitride and dry field oxidation stack and semiconductor device employing the same | Isik C. Kizilyalli, Pradip K. Roy, Hem M. Vaidya | 2002-04-30 |
| 6281138 | System and method for forming a uniform thin gate oxide layer | Isik C. Kizilyalli, Yi Ma, Pradip K. Roy | 2001-08-28 |
| 6246095 | System and method for forming a uniform thin gate oxide layer | Yi Ma, Pradip K. Roy | 2001-06-12 |
| 6090686 | Locos isolation process using a layered pad nitride and dry field oxidation stack and semiconductor device employing the same | Isik C. Kizilyalli, Pradip K. Roy, Hem M. Vaidya | 2000-07-18 |
| 6025280 | Use of SiD.sub.4 for deposition of ultra thin and controllable oxides | Isik C. Kizilyalli, Yi Ma, Pradip K. Roy | 2000-02-15 |
| 5966627 | In-situ doped silicon layers | Yaw S. Obeng | 1999-10-12 |
| 5940736 | Method for forming a high quality ultrathin gate oxide layer | Yi Ma, Pradip K. Roy | 1999-08-17 |