Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6218085 | Process for photoresist rework to avoid sodium incorporation | Simon John Molloy, Nace Layadi, Allen Yen, Steven Alan Lytle | 2001-04-17 |
| 6080671 | Process of chemical-mechanical polishing and manufacturing an integrated circuit | Annette M. Crevasse, William Easter, John A. Maze | 2000-06-27 |