Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9023227 | Increased deposition efficiency and higher chamber conductance with source power increase in an inductively coupled plasma (ICP) chamber | Jivko Dinev, Saravjeet Singh, Khalid Mohiuddin Sirajuddin, Tong Liu, Puneet Bajaj +3 more | 2015-05-05 |