| 12412789 |
Endpoint optimization for semiconductor processes |
Avishay Vaxman, Qintao Zhang, Jeffrey P. Koch, David P. Surdock, Wayne R. Swart +3 more |
2025-09-09 |
| 12308237 |
Ion implantation to increase MOSFET threshold voltage |
Qintao Zhang, Wei Zou |
2025-05-20 |
| 12183794 |
MOSFET gate shielding using an angled implant |
Qintao Zhang |
2024-12-31 |
| 12087585 |
Low-temperature implant for buried layer formation |
Qintao Zhang, Wei Zou, Judy Campbell Soukup |
2024-09-10 |
| 12046473 |
Backside wafer dopant activation |
Qintao Zhang, Vittoriano Ruscio, Wei Zou, David J. Lee |
2024-07-23 |
| 11804537 |
Channeled implants for SiC MOSFET fabrication |
Qintao Zhang, Wei Zou, Hans-Joachim L. Gossmann |
2023-10-31 |
| 11798982 |
Self-aligned trench MOSFET |
Qintao Zhang, Jason Appell, David J. Lee |
2023-10-24 |
| 11721743 |
Implantation enabled precisely controlled source and drain etch depth |
Qintao Zhang, Wei Zou |
2023-08-08 |
| 11695060 |
Ion implantation to form trench-bottom oxide of MOSFET |
Qintao Zhang, Wei Zou, Lei Zhong, David J. Lee, Felix Levitov |
2023-07-04 |
| 11527412 |
Method for increasing photoresist etch selectivity to enable high energy hot implant in SiC devices |
Qintao Zhang, David J. Lee, Felix Levitov, Lei Zhong, Wei Zou |
2022-12-13 |
| 11527637 |
Ion implantation to control formation of MOSFET trench-bottom oxide |
Qintao Zhang |
2022-12-13 |
| 11437488 |
Split-gate MOSFET with gate shield |
Qintao Zhang, David J. Lee, Jason Appell |
2022-09-06 |
| 11387338 |
Methods for forming planar metal-oxide-semiconductor field-effect transistors |
Qintao Zhang, Lei Zhong, David J. Lee, Felix Levitov, Carlos Caballero +1 more |
2022-07-12 |
