Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11860533 | Extreme ultraviolet mask absorber materials | Shuwei Liu, Shiyu Liu, Vibhu Jindal | 2024-01-02 |
| 11789358 | Extreme ultraviolet mask blank defect reduction | Wen Xiao, Vibhu Jindal, Weimin Li, Sanjay Bhat | 2023-10-17 |
| 11669008 | Extreme ultraviolet mask blank defect reduction methods | Wen Xiao, Sanjay Bhat, Shiyu Liu, Binni Varghese, Vibhu Jindal | 2023-06-06 |
| 11640109 | Extreme ultraviolet mask absorber materials | Shuwei Liu, Shiyu Liu, Vibhu Jindal, Ramya Ramalingam | 2023-05-02 |
| 11630385 | Extreme ultraviolet mask absorber materials | Shuwei Liu, Wen Xiao, Vibhu Jindal | 2023-04-18 |
| 11556053 | Extreme ultraviolet mask blank hard mask materials | Shuwei Liu, Wen Xiao, Vibhu Jindal | 2023-01-17 |
| 11537040 | Extreme ultraviolet mask blank hard mask materials | Shuwei Liu, Wen Xiao, Vibhu Jindal | 2022-12-27 |
| 11454876 | EUV mask blank absorber defect reduction | Binni Varghese, Vibhu Jindal, Shiyu Liu, Ramya Ramalingam | 2022-09-27 |
| 11300871 | Extreme ultraviolet mask absorber materials | Shiyu Liu, Shuwei Liu, Vibhu Jindal | 2022-04-12 |
| 7767365 | Methods for forming and cleaning photolithography reticles | Craig M. Carpenter, James Baugh, Steve McDonald, Robert T. Rasmussen, J. Brett Rolfson | 2010-08-03 |
| 7592105 | Methods for converting reticle configurations and methods for modifying reticles | Randall W. Chance, J. Brett Rolfson | 2009-09-22 |
| 7147974 | Methods for converting reticle configurations | Randall W. Chance, J. Brett Rolfson | 2006-12-12 |