Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7485204 | ECR plasma source and ECR plasma device | Seitaro Matsuo, Fumio Tanaka | 2009-02-03 |
| 4604180 | Target assembly capable of attaining a high step coverage ratio in a magnetron-type sputtering device | Yohichi Hirukawa, Naokichi Hosokawa | 1986-08-05 |