Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date | Approx Value ⓘ |
|---|---|---|---|---|
| 8888947 | Method and system for advanced process control in an etch system by gas flow control on the basis of CD measurements | Matthias Schaller, Uwe Schulze | 2014-11-18 | $1,887,000 |
| 7704889 | Method and system for advanced process control in an etch system by gas flow control on the basis of CD measurements | Matthias Schaller, Uwe Schulze | 2010-04-27 | $10,775,000 |