Issued Patents 2025
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12393127 | Exposure light beam phase measurement method in laser interference photolithography, and photolithography system | Leijie Wang, Yu Zhu, Ming Zhang, Jitao Xu, Xin Li +2 more | 2025-08-19 |
| 12346030 | Device and method for regulating and controlling incident angle of light beam in laser interference lithography | Leijie Wang, Yu Zhu, Ming Zhang, Yuezhu Yang, Xin Li +1 more | 2025-07-01 |
| 12332053 | Heterodyne grating interferometry system based on secondary diffraction | Yu Zhu, Leijie Wang, Ziwen Guo, Ming Zhang, Weinan Ye +1 more | 2025-06-17 |
| 12270645 | High-resolution phase detection method and system based on plane grating laser interferometer | Yu Zhu, Jinchun Hu, Rujin Han, Chang Tian, Ming Zhang +2 more | 2025-04-08 |
| 12189300 | Scanning interference lithographic system | Leijie Wang, Yu Zhu, Ming Zhang, Jitao Xu, Jiankun Hao +4 more | 2025-01-07 |