Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12393127 | Exposure light beam phase measurement method in laser interference photolithography, and photolithography system | Leijie Wang, Yu Zhu, Ming Zhang, Rong Cheng, Xin Li +2 more | 2025-08-19 |
| 12189300 | Scanning interference lithographic system | Leijie Wang, Yu Zhu, Ming Zhang, Rong Cheng, Jiankun Hao +4 more | 2025-01-07 |