Issued Patents 2025
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12393127 | Exposure light beam phase measurement method in laser interference photolithography, and photolithography system | Leijie Wang, Yu Zhu, Ming Zhang, Jitao Xu, Rong Cheng +2 more | 2025-08-19 |
| 12346030 | Device and method for regulating and controlling incident angle of light beam in laser interference lithography | Leijie Wang, Yu Zhu, Ming Zhang, Rong Cheng, Yuezhu Yang +1 more | 2025-07-01 |
| 12189300 | Scanning interference lithographic system | Leijie Wang, Yu Zhu, Ming Zhang, Jitao Xu, Rong Cheng +4 more | 2025-01-07 |