Issued Patents 2025
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12277960 | Modified top electrode contact for MRAM embedding in advanced logic nodes | Ashim Dutta, Oscar van der Straten, Theodorus E. Standaert | 2025-04-15 |
| 12261044 | Multi-layer hardmask for defect reduction in EUV patterning | Bhaskar Nagabhirava, Phillip Friddle, Ekimini Anuja De Silva, Jennifer Church, Nelson Felix | 2025-03-25 |
| 12243771 | Selective patterning of vias with hardmasks | John C. Arnold, Ashim Dutta, Timothy Mathew Philip, Sagarika Mukesh | 2025-03-04 |
| 12237175 | Polymerization protective liner for reactive ion etch in patterning | Bhaskar Nagabhirava, Phillip Friddle, Michael Goss, Yann Mignot | 2025-02-25 |