Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261044 | Multi-layer hardmask for defect reduction in EUV patterning | Phillip Friddle, Ekimini Anuja De Silva, Jennifer Church, Dominik Metzler, Nelson Felix | 2025-03-25 |
| 12237175 | Polymerization protective liner for reactive ion etch in patterning | Phillip Friddle, Michael Goss, Yann Mignot, Dominik Metzler | 2025-02-25 |